thin film deposition

A manufacturing method for a light splitting grating based on precision ruling and thin film deposition technologies was presented.

给出了采用光栅刻划和镀膜技术相结合研制光盘分束光栅的方法。

Application and Development of Computer Simulation in Thin Film Deposition

薄膜沉积机理的计算机模拟应用和发展

Research on thin film deposition rate deposited by sputtering

溅射镀成膜速率的研究

Finite element method simulation of affecting factors during metal thin film deposition

影响金属薄膜沉积初期因素的有限单元法模拟

Li4/ 3Ti5/ 3O4 thin film was prepared by solution deposition using lithium acetate and TiO ( C4H9) 4 as starting materials.

以醋酸锂和钛酸四丁酯为原料，采用溶液沉积法制备Li4/3Ti5/3O4薄膜。

Manufacture for light splitting grating in optical disk based on precision ruling and thin film deposition

基于精密刻划及薄膜沉积技术的光盘分束光栅研制

Thin film deposition by ICP-enhanced nonequilibrium magnetron sputtering process For ICP AES analysis.

射频等离子体增强非平衡磁控溅射沉积技术分析过程冗长，不利于生产质控。

Effect of plasma parameters on thin film deposition during multi-arc ion coating

多弧离子镀沉积过程中等离子体参数对薄膜沉积的影响

DOE's fabrication techniques mainly include laser beam or electron beam writing, RIE, ion milling and thin film deposition.

衍射光学元件的制作技术主要包括激光或电子束直写、反应离子刻蚀、离子束铣及薄膜沉积。

Computer simulation of optical thin film deposition

光学薄膜淀积的计算机仿真

Parallel computation for the thin film deposition on the now

基于机群系统的薄膜淀积并行计算

With these advantages, Microwave ECR plasma finds number of applications in the areas of etching technologies, thin film deposition and plasma source.

建立了ECR微波等离子体源离子输运的平板和圆柱模型，对离子历经的空间区域的输运过程进行了数值研究。

When the power is too high, ion bombardment effect results in the decrease of thin film deposition rate.

当功率过高时，离子的轰击作用导致薄膜的沉积速率降低。

The optical energy gap of CdTe thin film is mainly due to it deposition process, and varies little after annealing at various ambience.

CdTe薄膜光能隙主要由制备工艺决定，经过不同气氛下后处理后，变化不大。

A study of superconducting lead thin film deposition by high power co_2 CW laser

大功率CO2连续激光镀制超导铅膜研究

Low Stress Silicon Nitride Thin Film Deposition by PECVD

低应力PECVD氮化硅薄膜的制备

The fabrications are mainly based on semiconductor cleanroom facilities, which include thin film deposition, electron beam lithography, and etching.

这些工艺主要是基于超净室的一些设备，其中主要包括：薄膜沉积、电子束光刻、以及刻蚀。

Filtered Cathodic Arc Plasma Source and Thin Film Deposition

磁过滤的阴极弧等离子体源及其薄膜制备

This thesis studies the organic thin film deposition method, in order to prepare thin films of a higher order organic thin film transistor.

本论文主要研究有机薄膜的蒸镀方法，以此来制备薄膜有序性较高的有机薄膜晶体管。

Computer Simulation of Thin Film Deposition by RF Magnetron Sputtering

射频磁控溅射沉积薄膜的计算机模拟

The thin film deposition can control precisely the height of the step and can obtain smooth surface.

薄膜沉积法具有精确控制台阶高度及台阶表面较光滑的优点。

The iH pump is specially designed to cope with the harsh environment of thin film deposition process.

iH真空泵是特别为应付恶劣的薄膜工艺环境所设计。

A market forecast for Thin Film Deposition Tools is presented to 2006.

报告提供了2006年薄膜沉积市场预测信息.

The planar magnetron sputtering target for α-si: h thin film deposition

淀积α-Si：H薄膜的磁控靶

Hot Cathode Saddle Field Ion Source and its Application in Optical Thin Film Deposition

热阴极鞍场离子源及其在光学薄膜技术中的应用

Finally, we verified the practicability of floating harmonic probe in the process of thin film deposition.

最后，对悬浮谐波探针的实用性进行了研究。

Third, the quality of thin film deposition and the length of time is not much impact, but will affect the surface morphology.

沉积时间长短对薄膜质量并没有太大影响，但会影响表面形貌。

The Bi_2Te_3 thin film deposition on Au substrate using electrochemical atomic layer epitaxy

Bi2Te3热电薄膜的电化学原子层外延制备

Plasma enhanced chemical vapor deposition ( PECVD) is one of the matured and simple manipulated among the thin film deposition methods at low temperature.

等离子增强化学气相沉积（PECVD）是低温沉积硅膜的主要方法。

Fresnel lens fabricated by thin film deposition

薄膜沉积法制作菲涅耳透镜